Ellipsometry

Ellipsometry is a powerful nondestructive technique for the investigation of the dielectric properties of thin films.  It has applications in many industrial settings including semiconductor physics, microelectronics, displays, and solar panels.

In ellipsometry, the polarization change of a light beam is measured when it is reflected by the sample. This change in polarization can be used to measure material properties such as film thickness and optical constants.

ELLIPSOMETRIC PARAMETERS (Δ and Ψ)

ONE EXAMPLE OF COMMON ELLIPSOMETRY SETUPS USING A PEM

RELATIONSHIPS

APPLICATIONS

Material and surface characterization; surface science; material science; semiconductor industry

ADDITIONAL TOOLS

Ellipsometry Complete Solution Packages

FURTHER READING

S. N. Jasperson and S. E. Schnatterly, “An Improved Method for High Reflectivity Ellipsometry Based on a New Polarization Modulation Technique,” Rev. Sci. Instrum. 40, 761-767 (1969); Errata 41, 152 (1970).

R. M. A. Azzam and N. M. Bashara, Ellipsometry and Polarized Light, (North-Holland, Amsterdam, 1987), pp 260-262, 415-416.

G. E. Jellison, Jr. and F. A. Modine, “Two-channel Polarization Modulation Ellipsometer,” Appl. Opt. 29, 959-974 and references within.

G. E. Jellison, Jr. and F. A. Modine, “Two Modulator Generalized Ellipsometry: Theory,” Appl. Opt. 36, 8190-8198 and references within.

G. E. Jellison, Jr. and F. A. Modine,“Two Modulator Generalized Ellipsometry: Experiment and Calibration,” Appl. Opt. 36, 8184-8189.

PEMs in Ellipsometry
Calculating Psi and Delta

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