Level Sense and Alignment in Steppers and Scanners
The photolithographic process involves using a photomask that has been patterned with a part of the circuit design and exposing wafer layers on silicon to create the circuit structure layer by layer. As circuit features become smaller, the process demands greater precision.
Hinds Instruments has been intimately involved in designing the optical systems that level and align wafers before they are exposed in the photolithography process. The use of Hinds PEMs in these systems allows the wafers to be leveled and aligned with a precision that matches the rest of the circuit design process.
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Contact us for more information on Hinds PEMs used in level sensing and alignment for photolithography.